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    Corning 7980 Wafers
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    Corning 7980 Wafers

    Corning 7980 is a high-purity synthetic amorphous silicon dioxide manufactured via flame deposition. This noncrystalline, transparent silica glass stands out for its impressive optical and thermal properties

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    Corning 7980 Wafers

    Corning 7980 is a high-purity synthetic amorphous silicon dioxide manufactured via flame deposition. This noncrystalline, transparent silica glass stands out for its impressive optical and thermal properties, making it an excellent choice for applications in the photonics and semiconductor industries. With high transparency across a wide wavelength range, HPFS Corning 7980 performs especially well in UV and visible light, achieving transmission rates typically above 90% from 200 nm to 2,500 nm.

    Its low thermal expansion, strong resistance to thermal shock, and high durability against chemical and environmental degradation make it suitable for precision applications. Corning 7980 is available in various grades for different applications, such as the 7980 ArF grade and 7980 KrF grade.

    While JGS1 and JGS2 substrates are widely used for standard optical applications, Corning 7980 offers enhanced optical performance and thermal stability. These features make Corning 7980 particularly advantageous for high-precision optics and demanding photonics applications.

    Corning 7980 substrates are available in sizes ranging from 4 inches to 8 inches and are commonly used in applications such as optical windows, laser components, photolithography, and precision optics manufacturing.


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    The general specs are as follows sheet, if your specified is not included with it, you may freely tell us and we’ll pleased to customize them for you.


    specunit4"6"8"10"12”
    Diameter/size(or square)mm100150200250300
    Tolerance (±)mm0.20.20.20.20.2
    Thicknessmm0.10 or more0.30 or more0.40 or more0.50 or more0.50 or more
    Primary reference flatmm32.557.5Semi-notchSemi-notchSemi-notch
    LTV (5mmx5mm)µm< 0.5< 0.5< 0.5< 0.5< 0.5
    TTVµm< 2< 3<3<5<5
    Bowµm±20±30±40±40±40
    Warpµm≤ 30≤ 40≤ 50≤ 50≤ 50
    PLTV(5mm*5mm)<0.4um%≥95%≥95%≥95%≥95%≥95%
    Edge RoundingmmCompliant with SEMI M1.2 Standard/refer to IEC62276
    Surface Type
    Single Side Polished /Double Sides Polished
    Polished side Ranm≤1
    Back Side Criteriaµmgeneral 0.2-0.7 or customized


    Designed for demanding photonics, semiconductor, and laser applications, Corning 7980 delivers excellent performance across ultraviolet (UV), visible, and near-infrared (NIR) wavelengths. Its extremely low thermal expansion coefficient and excellent resistance to thermal shock make it an ideal substrate material for high-precision optical systems operating in challenging environments.

    Compared with conventional fused silica materials such as JGS1 and JGS2, Corning 7980 provides enhanced optical homogeneity, lower birefringence, superior laser resistance, and greater dimensional stability, making it the preferred choice for advanced optical engineering projects.

    Whether used in semiconductor manufacturing, photolithography, precision optics, or high-energy laser systems, Corning 7980 ensures long-term reliability and consistent performance.


    Features of Corning 7980 Fused Silica

    Exceptional Optical Transmission

    Corning 7980 offers excellent transmission over a broad spectral range from UV to near-infrared wavelengths.

    Typical transmission above 90%

    Excellent UV performance from 200 nm to 2500 nm

    Low absorption characteristics

    Suitable for high-energy optical systems

    Superior Thermal Stability

    Its extremely low coefficient of thermal expansion minimizes dimensional changes under temperature fluctuations.

    Benefits include:

    Outstanding thermal shock resistance

    Stable optical performance at elevated temperatures

    Reduced thermal distortion

    Improved system accuracy

    High Optical Purity

    Manufactured from ultra-pure synthetic silica, Corning 7980 contains extremely low impurity levels.

    Advantages:

    Excellent optical homogeneity

    Low inclusion content

    Low birefringence

    Reduced scattering losses

    Excellent Chemical Resistance

    Corning 7980 withstands harsh operating environments.

    Properties include:

    Resistant to acids and chemicals

    Corrosion resistance

    Environmental durability

    Long service life

    Superior Laser Damage Resistance

    Engineered for high-power laser applications.

    Suitable for:

    Excimer lasers

    UV laser systems

    High-energy photonics equipment

    Precision laser optics 


    Applications of Corning 7980

    Corning 7980 fused silica substrates are widely used across multiple high-tech industries.

    Semiconductor Industry

    Photolithography systems

    Wafer processing equipment

    Semiconductor inspection systems

    Precision semiconductor optics

    Photonics Industry

    Optical communication systems

    Photonic devices

    Waveguide components

    Optical sensors

    Laser Systems

    Excimer laser optics

    Laser windows

    Beam delivery components

    Laser resonators

    Precision Optics Manufacturing

    Optical windows

    Lenses

    Mirrors

    Beam splitters

    Optical flats

    Scientific Research

    Spectroscopy instruments

    Laboratory equipment

    Analytical devices

    Metrology systems


    Corning 7980 Wafers


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